1. ATD manufacturing plant.
Located in Algete (Madrid) close to Madrid Barajas Airport, it is a 4000 m2 ceramic materials production plant fitted with large mass production equipment, including:
- A general purpose big scale production furnace, up to 1700 ºC and over de 3 m3 capacity, gas fed.
- Three additional furnaces for test and assays, as well as several heaters.
- An industrial drying room with over 20 m2.
- A Nitrogen plant for nitruration and special thermal treatment
- A full system for monolithic material not stopping production, including an automatic packer unit.
- Other miscellaneous equipment: press, balls mill, lathes, drills, mixers, etc.
ATD manufacturing plant installations
2. ATD R&D labs
Located in Alcorcón, within the Business Park “El Encinar”, just by the exit 36 of Highway M-40 in Madrid, it is fully devoted to the ATD R&D activities.
We count on several spaces for the different activities:
- Mechanical workshop
- Sample analysis and processing
- Electronic Lab
- Chemical Lab
- Development and tests Lab
- Clean Room
- High temperature vacuum furnace room
Mechanical workshopChiller
High-temperature vacuum furnaceChemical Laboratory
The vacuum furnace system allows the synthesis of any material, being able to reach up to 10-7 torr and up to 1650 ºC.
Development and test Lab is equipped with 4 vacuum chambers for different purposes:
- Devices performance tests
- Oxidation processes
- Sputtering deposition processes
- Plasma etching processes.
All of them are reaching up to 10-7 Torr and have, as standard elements:
- PC with screen(s), keyboard, and WLAN connection
- Turbo pump Edwards mounted on an ISO 100
- Auxiliar pump Alcatel OME 25s
- 1 air pressure circuit for cleaning/valves operation
- 2 gas inlet circuits
- 2 mass flow controllers
- 1 water cooling chilling circuit
- Several air cooling fans system
Development and test Lab
CHAMBER 1: Device and emission performance tests
- ISO 400 with 6 passthroughs KF 40
- easy accessibility and operation from upper side
- Temperature control for up to 9 thermocouples
- dB9 connector for 9 analog signals
- frontal and upper viewers
- Power supply 300 V – 0,5 A
- 2 current sources (100 A, 22.3 A)
- pico-amperimeter (KEITHLEY DDM 6500)
- vacuum level up to 10-7 Torr
CHAMBER 2: Oxidation chamber. Reactive sputtering for special oxides thin film depositions
- ISO 160 T
- Frontal accessibility and viewer
- 90º configuration to prevent magnetron particles to get deposited on nano-meter thin oxide films
- One magnetron 2 inch
- dB9 connection ready
CHAMBER 3: Double magnetron sputtering deposition chamber. General purpose thin film depositions
ISO 160 cross
- Frontal accessibility and viewer
- 90º configuration to prevent magnetron particles to get deposited on nano-meter thin films, and to shorten target-substrate distance to reduce risk of oxidation of sputtered metals.
- dB9 connector for 9 signals
- one 1 inch magnetron
- one 2 inch magnetron
- one manual gate valve ISO 100
CHAMBER 4: Plasma etching chamber
- Chamber 300x300x350 mm
- Frontal accessibility and viewer
- Chamber 4 test environment is completed with:
– UV halogen bulb
– Monochromator transmiting a mechanically selectable narrow band of wavelengths of light to allow the full characterization of devices as a function of temperature, incidents photons wavelenghts, voltage …
Advanced Thermal Devices S.L.
C/ Villaconejos, 4.
28925-Alcorcón (Madrid, Spain).
VAT: ESB-86823036